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Electron affinity and work function of differently oriented and doped diamond surfaces determined by photoelectron spectroscopy

机译:通过光电子能谱确定不同取向和掺杂的金刚石表面的电子亲和力和功函数

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摘要

We investigate band bending, electron affinity and work function of differently terminated, doped and oriented diamond surfaces by X-ray and ultraviolet photoelectron spectroscopy (XPS and UPS). The diamond surfaces were polished by a hydrogen plasma treatment and present a mean roughness below 10 Å. The hydrogen-terminated diamond surfaces have negative electron affinity (NEA), whereas the hydrogen-free surfaces present positive electron affinity (PEA). The NEA peak is only observed for the boron-doped diamond (100)-(2×1):H surface, whereas it is not visible for the nitrogen-doped diamond (100)-(2×1):H surface due to strong upward band bending. For the boron-doped diamond (111)-(1×1):H surface, the NEA peak is also absent due to the conservation of the parallel wavevector component (k||) in photoemission. Electron emission from energy levels below the conduction band minimum (CBM) up to the vacuum level allowed the electron affinity to be measured quantitatively for PEA as well as for NEA. The emission from populated surface states forms a shoulder or a peak at lower kinetic energies, depending on the NEA behavior and additionally shows a dispersion behavior. The low boron-doped diamond (100)-(2×1):H surface presents a high-intensity NEA peak with a FWHM of 250 meV. Its cut-off is situated at a kinetic energy of 4.9 eV, whereas the upper limit of the vacuum level is situated at 3.9 eV, resulting in a NEA of at least −1.0 eV and a maximum work function of 3.9 eV. The high-boron-doped diamond (100) surface behaves similarly, showing that the NEA peak is present due to the downward band bending independent of the boron concentration. The nitrogen-doped (100)-(2×1):H surface shows a low NEA of −0.2 eV but no NEA peak due to the strong upward band bending. The (111)-(1×1):H surface does not show a NEA peak due to the k|| conservation in photoemission; is situated at 4.2 eV or below, resulting in a NEA of at least −0.9 eV and a maximum work function of 4.2 eV. The high-intensity NEA peak of boron-doped diamond seems to be due to the downward band bending together with the reduced work function because of hydrogen termination. Upon hydrogen desorption at higher annealing temperatures, the work function increases, and NEA disappears. For the nitrogen-doped diamond (100) surface, the work function behaves similarly, but the observation of a NEA peak is absent because of the surface barrier formed by the high upward band bending.
机译:我们通过X射线和紫外光电子能谱(XPS和UPS)研究了不同终止,掺杂和取向的金刚石表面的能带弯曲,电子亲和力和功函数。金刚石表面通过氢等离子体处理抛光,平均粗糙度低于10Å。氢封端的金刚石表面具有负电子亲和力(NEA),而无氢表面则具有正电子亲和力(PEA)。仅在掺硼金刚石(100)-(2×1):H表面观察到NEA峰,而在氮掺杂金刚石(100)-(2×1):H表面观察不到NEA峰强烈的向上弯曲带。对于掺硼金刚石(111)-(1×1):H表面,由于在光发射中平行波矢量分量(k ||)的守恒,因此也没有NEA峰。从低于导带最小值(CBM)的能级到真空能级的电子发射,可以定量测量PEA和NEA的电子亲和力。取决于NEA行为,填充的表面态的发射在较低的动能处形成肩峰或峰,并另外显示出色散行为。低硼掺杂金刚石(100)-(2×1):H表面表现出高强度NEA峰,FWHM为250 meV。它的截止点位于4.9 eV的动能处,而真空水平的上限位于3.9 eV处,从而导致NEA至少为-1.0 eV,最大功函数为3.9 eV。高硼掺杂金刚石(100)表面的行为相似,表明NEA峰的存在是由于向下的能带弯曲而与硼浓度无关。氮掺杂的(100)-(2×1):H表面显示出-0.2 eV的低NEA,但由于强烈的向上能带弯曲而没有NEA峰。由于k ||,(111)-(1×1):H表面未显示NEA峰。保持光发射;处于4.2 eV或以下,则NEA至少为-0.9 eV,最大功函数为4.2 eV。掺硼金刚石的高强度NEA峰似乎是由于向下带弯曲以及由于氢封端而导致的功函数降低。在较高的退火温度下氢解吸后,功函数增加,NEA消失。对于掺氮金刚石(100)表面,功函的行为类似,但是由于高向上的带弯曲形成了表面势垒,因此没有观察到NEA峰。

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